Plasma processing

From Wikipedia, the free encyclopedia
This is the current revision of this page, as edited by imported>IntentionallyDense at 11:56, 30 December 2023 (v2.05b - WPCleaner - Fix errors for CW project (Category before last heading)). The present address (URL) is a permanent link to this version.
(diff) ← Previous revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

Template:Refimprove

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]

Plasma processing techniques include:


Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.


References

<templatestyles src="Reflist/styles.css" />

  1. Script error: No such module "citation/CS1".

Script error: No such module "Check for unknown parameters".