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  • ...scription|Process used to produce micromachinery or microelectromechanical systems}} ...s a process used to produce [[micromachinery]] or [[microelectromechanical systems]] (MEMS). ...
    3 KB (386 words) - 17:39, 17 December 2024
  • {{Short description|Microelectromechanical system device}} ...jita|first1=Hiroyuki|last2=Toshiyoshi|first2=Hiroshi|title=Micro actuators and their applications|journal=Microelectronics Journal|publication-date=Septem ...
    2 KB (321 words) - 22:10, 24 February 2024
  • ...|date=August 1998 |title=Surface micromachining for microelectromechanical systems |journal=Proceedings of the IEEE |volume=86 |issue=8 |pages=1552–1574 |doi= ...ain advantage of this machining process is the ability to build electronic and mechanical components (functions) on the same substrate. Surface micro-mach ...
    5 KB (626 words) - 04:54, 27 June 2024
  • {{Short description|System of microelectromechanical devices}} ...[[millimeter]]s and they may be vulnerable to electromagnetic disablement and destruction by microwave exposure. ...
    9 KB (1,268 words) - 02:46, 27 June 2025
  • ...81439837320|location=Boca Raton, FL|pages=7}}</ref> It focuses on physical and chemical processes as well as the production or manipulation of structures ...roved performance, functionality, and reliability, all while reducing cost and increasing volume. This development led to the [[Information Revolution]]. ...
    7 KB (911 words) - 01:49, 22 June 2025
  • {{Short description|Fabrication at micrometre scales and smaller}} ...rized copper interconnect, down to the polysilicon (pink), wells (greyish) and substrate (green)]] ...
    20 KB (2,597 words) - 03:31, 25 May 2025
  • ...}}</ref> the function of the lungs in the form of a [[capnograph]] device, and many industrial processes. ...bonate based CO<sub>2</sub> sensors with high performance |journal=Sensors and Actuators B: Chemical |volume=34 |issue=1–3 |pages=383–7 |date=1996 |doi=10 ...
    11 KB (1,509 words) - 01:45, 13 May 2025
  • ...ral design of a physical device, or system, often comprising both hardware and software. For other uses, see for example [[Computer architecture]], [[Comp ...ime dynamic behavior identification and selection |journal=Knowledge-Based Systems |volume=21 |issue=4 |pages=273–283 |year=2008|doi=10.1016/j.knosys.2007.05. ...
    11 KB (1,452 words) - 12:28, 5 January 2025
  • | foundation = {{start date and age|1997}} (merger of KLA and Tencor) ...[Wafer (electronics)|wafer]], [[reticle (semiconductor industry)|reticle]] and other related industries ...
    17 KB (2,047 words) - 14:54, 30 June 2025
  • Include the dates applicable if possible, and separate each name with a linebreak. | Harvard_designation = <!--spacecraft launched 1962 and earlier only (e.g. 1957 Alpha 2)--> ...
    13 KB (1,763 words) - 19:09, 22 April 2025
  • {{short description|Type of ultraviolet laser important in chip manufacturing and eye surgery}} ...rated circuit]]s or "chips", [[eye surgery]], and [[microelectromechanical systems|micromachining]]. ...
    24 KB (3,413 words) - 05:11, 23 May 2025
  • ...ed to [[DARPA]] in 1986 first introducing the term "microelectromechanical systems"]] ...rroundings (such as [[microsensor]]s).<ref>{{cite book|title=Nanocomputers and Swarm Intelligence|vauthors=Waldner JB|publisher=[[ISTE Ltd|ISTE]] [[John W ...
    45 KB (6,315 words) - 19:31, 8 October 2025
  • ...stem]]s" (μTAS). LOCs may use [[microfluidics]], the physics, manipulation and study of minute amounts of fluids. However, strictly regarded "lab-on-a-chi [[File:Labonachip20017-300.jpg|thumb|[[Microelectromechanical systems]] [[integrated circuit|chip]], sometimes called "lab on a chip"]] ...
    26 KB (3,510 words) - 19:14, 25 May 2025
  • ...to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. ...07/s00542-002-0242-2|bibcode=2004MiTec..10..265L |s2cid=111062837 }}</ref> and (>&nbsp;40) has been demonstrated from the dry resist.<ref>{{Cite journal | ...
    14 KB (2,067 words) - 19:58, 9 April 2025
  • ...powerful [[fluorinating agent]] with the chemical formula {{chem|XeF|2}}, and one of the most stable [[xenon compounds]]. Like most [[Covalent bond|coval It has a nauseating odour and low [[vapor pressure]].<ref>{{cite book |author1=James L. Weeks |author2=Ma ...
    26 KB (3,400 words) - 23:30, 19 June 2025
  • ...ps://onlinelibrary.wiley.com/doi/10.1111/php.12751 |journal=Photochemistry and Photobiology |language=en |volume=93 |issue=5 |pages=1165–1169 |doi=10.1111 ...[extreme ultraviolet lithography|extreme ultraviolet lithography (EUVL)]], and [[X-ray lithography]]. The wavelength of light used determines the minimum ...
    59 KB (8,214 words) - 13:35, 16 October 2025
  • ...ion with high reliability and low g-sensitivity. The nanoscale transistors and nanoscale mechanical components (on a separate die) are integrated on the s ...2 = Massimiliano Di Ventra}}</ref> Applications include [[accelerometer]]s and sensors to detect [[chemical substance]]s in the air. ...
    48 KB (6,469 words) - 06:25, 23 May 2025
  • ...]], [[control system]]s, [[signal processing]], [[optics]], [[photonics]], and [[electrical substation]]s ...abstract thinking, analytical thinking (see also [[Glossary of electrical and electronics engineering]]) ...
    79 KB (10,826 words) - 01:09, 16 November 2025
  • ...829–1891)<br />The Mechanics Institute (1885–1891)<br />Rochester Athenæum and Mechanics Institute (1891–1944) | established = {{Start date and age|1829}} ...
    99 KB (13,159 words) - 17:53, 14 November 2025